ARC Consortium: William & Mary
Lab Equipment and Apparatus - Surface Characterization Lab II (L121)
M44 Variable Angle Spectroscopic Ellipsometer
Ellipsometry is a technique used to characterize optical properties and thicknesses of thin films by measuring the change in polarization state of light reflected from the surface of (or through) a sample.
Calculations are carried out by using physical models of specified layered structures to simulate the interaction of polarized light on the sample.
Available Model Layer Types include:
- Alloy
- Temp
- Cauchy
- Lorentz Oscillator
- Graded
- Anisotropic
- Kramers-Kronig
- Delay
- Virtual Interface
- Surface Roughness
Xenon lamp source provides continuous spectral range of 220-2000 nm, with sharp lines between 800 and 900 nm, allowing for a thin film thickness measurement range of about 5-1000 nm
Available configurations:
- Ex-situ
- In-situ
Ex-Situ Operating Instructions
Troubleshooting
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