ARC Consortium: William & Mary
Employee Information - Surface Modification (L207)
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Nimel Theodore College of William and Mary Department of Applied Sciences Applied Research Center Lab 207 phone: (757)269-5729 |
Work Interests
Plasma source ion implantation (PSII) is a technique to modify surfaces to enhance desired electrical, mechanical, and/or optical properties. Former studies have shown the advantages of implanting ions to increase control friction, surface hardness, and resist corrosion. PSII is a more beneficial than "traditional" beam-based ion implantation techniques because it uniformly implants ions into three-dimensional samples through a low temperature, non-line-of-sight process.
Contact information:
E-Mail: ndtheo@wm.edu
Phone: (757)269-5729
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