ARC Consortium: William & Mary
Lab Equipment and Apparatus - Surface Modification (L207)
Lab Apparatus
- Radio frequency Planar coil inductively coupled plasma source to conduct large-scale immersed ion implantation.
- Plasma-enhanced chemical vapor deposition (PECVD)
- High voltage power supply
Emergency Resources
- First Aid Kit
University EH&S Officer
Dr. Michael Kelley, (757) 269-5736
Return to Lab 207 detail page.