1. Clean glassware:
 a. Fill glassware to be used with UVTOC water from Millipore system
  dispenser.
 b. Sprinkle a little Alconox into vessels with clean water.
 c. Ultra-sonic clean in plastic dish so that edges of clean glassware do
  NOT touch edges of ultrasonic cleaner.
 d. 15 minutes ultrasonic then pour out Alconox+water and rinse with
  Millipore water.
 e. Repeat steps a. - d. two more times.
 f. A clean 1 liter beaker can now be filled with Millipore water,
  heated, and used as ‘leach’ step for 100 ml beaker. (Leach
  100 ml beaker by filling beaker with near-boiling Millipore
  water and pour off after 15-30 sec.) Rinse 100 ml beaker with    methanol.
 g. Cover cleaned glassware with a loosely-fitting tent of Al foil
  to keep dust from settling onto cleaned surfaces.

2. Use only stainless tweezers (that have been degreased in clean Acetone)
 to put wafer into a 100 ml beaker.
3. Fill beaker to half full with Trichloroethlyene.
4. Add enough hot water to small ultrasonic basin (with cold or cooling
 water) to make temperature 55 C (NO hotter;since wafers will
 shatter if ultrasonically cleaned in hot Acetone due to cavitation
 and uncontrolled agitation).
5. Ultrasonically clean at 55 C for 3 minutes with the voltage setting
 (on an autotransformer supplying the ultrasonic device) turned
 down to 30 V or 40 V AC or so--look for signs of agitation
 that should be avoided!

 Never measure the temperature of the degreasing solvent directly
 with the thermometer since this will simply foul the solution
 directly exposed to the wafer.

6. Decant (pour off) solvent into appropriate waste solvent beaker
 for appropriate disposal later.

7. Repeat steps 3 through 6 for Acetone then Methanol (3 minutes each
 at 55 C).

8. Remove wafer from a small puddle of methanol with stainless tweezers
 directly into the stream of dry nitrogen (blow-off from small dewar
 with a 0.22 micron filter in the blow-off line). Dry the wafer
 completely, taking care to force the adhered drop of methanol
 away from the sensitive area (shiny surface of polished wafer).
 A receding, advancing, then receding droplet of methanol will
 leave a stain with traces of contamination on the surface of the
 wafer.

 The best way to do this operation is to tip the beaker at 45 deg
 or so, push the wafer into a position (the edge of the wafer
 is off the side  and bottom of the beaker) then grasp the very
 edge of the wafer with the tweezer. Practice with a used wafer
 before trying this with a properly cleaned wafer.

9. Put wafer into carrier and close lid with dry nitrogen blowing
 gently across the wafer carrier.