Thin Films 2016
7th International Workshop on Thin Films and New Ideas for Pushing the Limits of RF Superconductivity
July 27-29, 2016
Thomas Jefferson National Accelerator Facility
Newport News, VA
The seventh workshop in this series will continue the goal of providing a forum for new initiatives in innovative thin films and related technology to advance future generations of superconducting RF accelerators. Present superconducting RF accelerator technology is based on predominately bulk niobium, for which the state of the art in performance is reaching the theoretical limit. Thin film technology offers the prospect of considerable savings in fabrication costs and opens the way with innovative technologies to the use of alternative superconducting materials with enhanced intrinsic properties such as critical temperature and critical field. Intensive and coordinated R&D effort is of decisive importance for the scientific Community.
The primary aim of the workshop is to support this initiative by providing an opportunity to bring together individuals and institutions working in this effort and infusing expertise of specialists from related disciplines (superconductivity, plasma physics, material science, nanotechnology, RF engineering and industry. Reports on work from each participating group and extensive discussions on existing problems, new ideas and programs for the future will constitute the primary focus of the program.
Larry Phillips (Jefferson Lab, USA)
Local Organizing Committee:
International Organizing Committee:
V. Palmieri (INFN and Univ. of Padua), Chairman of the O.C.
I. Ben-Zvi (Brookhaven National Laboratory, USA)
R. Boxman (Tel Aviv University, Israel)
A. Gurevich (Old Dominion University Univ, USA)
K. Liu 刘克新 (Peking University, China)
L. Phillips (Jefferson Lab, USA)
R. Vaglio (Univ. Napoli and CNR-SPIN, ITALY)
V. Venturini(CERN, Switzerland)
Coordination and Secretariat:
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