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Hydrogen Workshop
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Hydrogen Workshop Poster

    Contamination Control Strategies in Particulate Free Processing
    One day short course, November 14, 2002
    By Prof. John F. O'Hanlon

    Contamination control is cross-disciplinary activity involving physics, chemistry, mechanics, electromagnetics, and other disciplines. Contamination is not simply good house keeping; it also involves the understanding of how processes and equipment operate as well as how process equipment is designed.

    You may register for the Short Course when you submit your workshop registration. If you have already registered for the workshop and wish to ADD the Short Course, please send your request to: sthomas@jlab.org.

    This course begins with an introduction on type of contaminants (molecular and particulate) and clean rooms, and today.s concerns. Next particle dynamics: how particles move and how they are attached and released from surfaces is discussed. Particle measurement techniques both inside and outside vacuum environment will be described. Further, molecular and particulate contaminations in vacuum systems will be portrayed.

    Liquid cleaning of surfaces will be discussed. In addition, dry cleaning of vacuum chambers and cleaning of various materials will be highlighted. Management of water vapor in vacuum systems: role of water, prevention of the aerosol formation and possible subsequent particulate transport mechanisms will be presented.

    1. Introduction
    What is contamination (molecular?
    Particulate)?
    What is a clean room?
    Today's concerns

    2. Particle dynamics
    Fluid drag
    Gravitational settling
    Thermophoresis
    Electostatics
    Convection
    Adhesion

    3. Particle measurement techniques
    Detecting particles in vacuum
    Ideal detector
    Sensitivity vs response time
    Statistics of rarified events

    4. Vacuum pump contamination
    Turbo pump
    Cryo pump
    Ion pump

    5. Dry cleaning of vacuum chambers
    Cleaning of Al, Cu, Nb and SS
    Thermal baking
    UV simulated desorption
    Plasma cleaning

    6. Liquid cleaning of surfaces
    Liquid film draining
    Zeta potential
    Streaming potential
    Surfaces: (clean room & chamber walls)
    Preventing Re-Deposition
    Surface wiping model

    7. Management of water vapor
    Role of water
    Formation of aerosols
    Preventing aerosols
    Adiabatic compression



    content by Ganapati Myneni
    maintained by webmaster@jlab.org
    updated August 19, 2002