Portable H2 as mentioned in the
Hydrogen / Deuterium cleaning procedure
Papers:

Atomic Hydrogen Cleaning of Semiconductor Photocathodes, AVS abstracts, Contamination - Its Measurement and Control in Vacuum Systems, C. Sinclair, M. Poelker, and J. S. Price (March 1997)

Hydrogen/Deuterium cleaning procedure JLAB-TN-02-007 , Maud Baylac (2002)

Coaxial Resonators with Helical Inner Conductor, IRE Proceedings, W.W. Macalpine & R.O. Schildknecht, (Dec 1959)

Atomic Hydrogen Cleaning of Semiconductor Photocathodes , C. Sinclair, M. Poelker, and J. S. Price (1997)

High-density production of spin-polarized atomic hydrogen and deturium, M.Poelker, K.P. Coulter, R.J. Holt, C.E. Jones, R.S. Kowalczyk, L.Young, B. Zeidman and D.K. Toporkov (Sept.1994) (see Figure 4) 
 

Mechanical Drawings:

H2_glassware.dxf
 

Coaxial Resonator

Front View
Showing UHF Panel mount connector

Top View
Showing connection of copper coil 
to the UHF connector

Bottom View
Showing connection of copper coil 
to the Resonator sheild

Page updated on 
March 08, 2002
Maintained by baylac@jlab.org
Upper Portion of the Portable Hydrogen Cleaner.
Side View of the Upper Portion of the Portable Hydrogen Cleaner.
Coaxial Resonator - 
where RF is applied to the Hydrogen Glassware.

A Photo diode for measuring light intensity of the Plasma discharge is shown on the right.
Lower portion of the Hydrogen Glassware.
Hydrogen Gas enters the Hydrogen Chamber 
via the valve on the right.
An RF Signal generator feeds into a 50 watt
linear amplifier.  The RF then travels through 
a SWR meter, which is used to adjust the 
ratio of incident to reflected power, to a 
sleeve surrounding the glassware located below 
the table.